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ISPD
2010
ACM
13 years 11 months ago
2010
ACM
ISPD
2010
ACM
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2010
ACM
ISPD
2010
ACM
13 years 3 months ago
2010
ACM
ISPD
2010
ACM
13 years 11 months ago
2010
ACM
NBTI (Negative Bias Temperature Instability) has emerged as the dominant failure mechanism for PMOS in nanometer IC designs. However, its impact on one of the most important compo...
ISPD
2010
ACM
13 years 11 months ago
2010
ACM
Double Patterning Lithography (DPL) is one of the few hopeful candidate solutions for the lithography for CMOS process beyond 45nm. DPL assigns the patterns less than a certain di...