ASPDAC
2010
ACM
13 years 2 months ago
2010
ACM
As Double Patterning Lithography(DPL) becomes the leading candidate for sub-30nm lithography process, we need a fast and lithography friendly decomposition framework. In this pape...
ASPDAC
2007
ACM
13 years 8 months ago
2007
ACM
Traditional timing variation reduction techniques are only able to decrease the gate delay variation by incurring a delay overhead. In this work, we propose novel and effective sp...
ASPDAC
2006
ACM
13 years 10 months ago
2006
ACM
With shrinking technology, the timing variation of a digital circuit is becoming the most important factor while designing a functionally reliable circuit. Gate sizing has emerged...