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» A DOE Set for Normalization-Based Extraction of Fill Impact ...
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ISQED
2007
IEEE
104views Hardware» more  ISQED 2007»
15 years 3 months ago
A DOE Set for Normalization-Based Extraction of Fill Impact on Capacitances
Andrew B. Kahng, Rasit Onur Topaloglu
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VLSID
2007
IEEE
103views VLSI» more  VLSID 2007»
15 years 10 months ago
Impact of Modern Process Technologies on the Electrical Parameters of Interconnects
Abstract-- This paper presents the results obtained from an experimental study of the impact of modern process technologies on the electrical parameters of interconnects. Variation...
Debjit Sinha, Jianfeng Luo, Subramanian Rajagopala...