Double Patterning Lithography (DPL) is one of the few hopeful candidate solutions for the lithography for CMOS process beyond 45nm. DPL assigns the patterns less than a certain di...
We consider the problem of fairly matching the left-hand vertices of a bipartite graph to the right-hand vertices. We refer to this problem as the optimal semimatching problem; it...
Nicholas J. A. Harvey, Richard E. Ladner, Lá...
Many tasks in computer vision involve assigning a label (such as disparity) to every pixel. These tasks can be formulated as energy minimization problems. In this paper, we conside...
We show how to speed up two string-matching algorithms: the Boyer-Moore algorithm (BM algorithm), and its version called here the reverse factor algorithm (RF algorithm). The RF al...
Maxime Crochemore, Thierry Lecroq, Artur Czumaj, L...
To prevent large error accumulation in multiple image registration considering real-time applications, we propose a new fast global mosaic method using sequential block matching in...