519 search results - page 68 / 104 » A New Approach to Strongly Polynomial Linear Programming |
166
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TCAD
2010
14 years 8 months ago
2010
Abstract--In double patterning lithography (DPL) layout decomposition for 45nm and below process nodes, two features must be assigned opposite colors (corresponding to different ex...
124
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EMNLP
2010
14 years 10 months ago
2010
We present a novel approach to relation extraction that integrates information across documents, performs global inference and requires no labelled text. In particular, we tackle ...
112
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INFOCOM
2008
IEEE
15 years 7 months ago
2008
IEEE
—Aggregate scheduling is one of the most promising solutions to the issue of scalability in networks, like DiffServ networks and high speed switches, where hard QoS guarantees ar...
120
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ICCV
2003
IEEE
16 years 3 months ago
2003
IEEE
We present a new approach to 3D scene modeling based on geometric constraints. Contrary to the existing methods, we can quickly obtain 3D scene models that respect the given const...
125
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TCAD
2002
15 years 29 days ago
2002
Chemical-mechanical polishing (CMP) and other manufacturing steps in very deep submicron VLSI have varying effects on device and interconnect features, depending on local character...