152 search results - page 4 / 31 » A Practical Agent-Based Approach for Pattern Layout Design |
TVLSI
2010
14 years 4 months ago
2010
The gap between VLSI technology and fabrication technology leads to strong refractive effects in lithography. Consequently, it is a huge challenge to reliably print layout features...
CEC
2007
IEEE
15 years 3 months ago
2007
IEEE
— In this paper we present a new algorithm for the Layout Optimization Problem: this concerns the placement of circular, weighted objects inside a circular container, the two obj...
83
Voted
ICS
2005
Tsinghua U.
15 years 3 months ago
2005
Tsinghua U.
Excessive power consumption is becoming a major barrier to extracting the maximum performance from high-performance parallel systems. Therefore, techniques oriented towards reduci...
CGO
2004
IEEE
15 years 1 months ago
2004
IEEE
In this paper, we describe a generalized approach to deriving a custom data layout in multiple memory banks for array-based computations, to facilitate high-bandwidth parallel mem...
100
Voted
ISPD
2007
ACM
14 years 11 months ago
2007
ACM
When VLSI technology scales toward 45nm, the lithography wavelength stays at 193nm. This large gap results in strong refractive effects in lithography. Consequently, it is a huge...