Current lithography techniques use a light wavelength of 193nm to print sub-65nm features. This introduces process variations which cause mismatches between desired and actual waf...
The use of Support Vector Machines (SVMs) to represent the performance space of analog circuits is explored. In abstract terms, an analog circuit maps a set of input design parame...
Fernando De Bernardinis, Michael I. Jordan, Albert...
This paper presents a new test methodology which utilizes the Programming Language Interface (PLI) for performing fault simulation of combinational or full scan Intellectual Prope...
Pedram A. Riahi, Zainalabedin Navabi, Fabrizio Lom...
—Variations of process parameters have an important impact on reliability and yield in deep sub micron IC technologies. One methodology to estimate the influence of these effects...
— This paper presents some circuitry for use within a visual-processing depth-recovery algorithm based upon spike timing. The accuracy of the depth calculation relies on a predic...