Continuously shrinking feature sizes result in an increasing susceptibility of circuits to transient faults, e.g. due to environmental radiation. Approaches to implement fault tol...
Double Patterning Lithography (DPL) is one of the few hopeful candidate solutions for the lithography for CMOS process beyond 45nm. DPL assigns the patterns less than a certain di...
Automated analog sizing is becoming an unavoidable solution for increasing analog design productivity. The complexity of typical analog SoC subsystems however calls for efficient ...
Georges G. E. Gielen, Trent McConaghy, Tom Eeckela...
? An efficient and compact canonical form is proposed for the Boolean matching problem under permutation and complementation of variables. In addition an efficient algorithm for co...
We present a method for designing operational amplifiers using reversed geometric programming, which is an extension of geometric programming that allows both convex and non-conve...