Double Patterning Lithography (DPL) is one of the few hopeful candidate solutions for the lithography for CMOS process beyond 45nm. DPL assigns the patterns less than a certain di...
Abstract. The purpose of this paper is (1) to provide a theoretical justification for the use of Monte-Carlo sampling for approximate resolution of NP-hard maximization problems in...
We present the first local approximation schemes for maximum independent set and minimum vertex cover in unit disk graphs. In the graph model we assume that each node knows its geo...
We analyze the performance of evolutionary algorithms on various matroid optimization problems that encompass a vast number of efficiently solvable as well as NP-hard combinatoria...
In the field of robust optimization, the goal is to provide solutions to combinatorial problems that hedge against variations of the numerical parameters. This constitutes an effor...
Monaldo Mastrolilli, Nikolaus Mutsanas, Ola Svenss...