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A parameterized mask model for lithography simulation
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A parameterized mask model for lithography simulation
15 years 7 months ago
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Zhenhai Zhu
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On linewidth-based yield analysis for nanometer lithography
15 years 9 months ago
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— Lithographic variability and its impact on printability is a major concern in today’s semiconductor manufacturing process. To address sub-wavelength printability, a number of...
Aswin Sreedhar, Sandip Kundu
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