18306 search results - page 3047 / 3662 » Algorithmics in Exponential Time |
170
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ICCAD
2007
IEEE
16 years 3 months ago
2007
IEEE
—As the 193nm lithography is likely to be used for 45nm and even 32nm processes, much more stringent requirement will be posed on Optical Proximity Correction (OPC) technologies....
151
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ICCAD
2004
IEEE
16 years 3 months ago
2004
IEEE
Wire pipelining emerges as a new necessity for global wires due to increasing wire delay, shrinking clock period and growing chip size. Existing approaches on wire pipelining are ...
155
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ICCAD
2003
IEEE
16 years 3 months ago
2003
IEEE
In this paper, we present improvements to recursive bisection based placement. In contrast to prior work, our horizontal cut lines are not restricted to row boundaries; this avoid...
150
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ICCAD
2003
IEEE
16 years 3 months ago
2003
IEEE
Current CMOS technologies are characterized by interconnect lines with increased relative resistance w.r.t. driver output resistance. Designs generate signal waveshapes that are v...
157
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ICCAD
2003
IEEE
16 years 3 months ago
2003
IEEE
The recent demand for system-on-chip RF mixed-signal design and aggressive supply-voltage reduction require chip-level accurate analysis of both the substrate and power delivery s...