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DAC
2006
ACM
16 years 5 months ago
Process variation aware OPC with variational lithography modeling
Optical proximity correction (OPC) is one of the most widely used resolution enhancement techniques (RET) in nanometer designs to improve subwavelength printability. Conventional ...
Peng Yu, Sean X. Shi, David Z. Pan
142
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ESORICS
2009
Springer
16 years 5 months ago
Attribute-Sets: A Practically Motivated Enhancement to Attribute-Based Encryption
In distributed systems users need to share sensitive objects with others based on the recipients' ability to satisfy a policy. Attribute-Based Encryption (ABE) is a new parad...
Rakeshbabu Bobba, Himanshu Khurana, Manoj Prabhaka...
ICCD
2004
IEEE
100views Hardware» more  ICCD 2004»
16 years 1 months ago
Layout Driven Optimization of Datapath Circuits using Arithmetic Reasoning
This paper proposes a new formalism for layout-driven optimization of datapaths. It is based on preserving an arithmetic bit level representation of the arithmetic circuit portion...
Ingmar Neumann, Dominik Stoffel, Kolja Sulimma, Mi...
JCDL
2006
ACM
172views Education» more  JCDL 2006»
15 years 10 months ago
A comprehensive comparison study of document clustering for a biomedical digital library MEDLINE
Document clustering has been used for better document retrieval, document browsing, and text mining in digital library. In this paper, we perform a comprehensive comparison study ...
Illhoi Yoo, Xiaohua Hu
SIGMETRICS
2010
ACM
178views Hardware» more  SIGMETRICS 2010»
15 years 9 months ago
Optimality, fairness, and robustness in speed scaling designs
System design must strike a balance between energy and performance by carefully selecting the speed at which the system will run. In this work, we examine fundamental tradeoffs i...
Lachlan L. H. Andrew, Minghong Lin, Adam Wierman