—Double patterning lithography (DPL) provides an attractive alternative or a supplementary method to enable the 32nm and 22nm process nodes, relative to costlier technology optio...
Kwangok Jeong, Andrew B. Kahng, Rasit Onur Topalog...
SystemC-Plus from the ODETTE project provides the ability to simulate and synthesise object-oriented specifications into hardware. The current ODETTE compiler translates each obj...
Temporal causal modeling has been a highly active research area in the last few decades. Temporal or time series data arises in a wide array of application domains ranging from med...
Real-time functional magnetic resonance imaging (rtfMRI) enables classification of brain activity during data collection thus making inference results accessible to both the subj...
Hao Xu, Yongxin Taylor Xi, Ray Lee, Peter J. Ramad...
Abstract— Memetic algorithms arise as very effective algorithms to obtain reliable and high accurate solutions for complex continuous optimization problems. Nowadays, high dimens...