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TCAD
2010
194views more  TCAD 2010»
14 years 4 months ago
Layout Decomposition Approaches for Double Patterning Lithography
Abstract--In double patterning lithography (DPL) layout decomposition for 45nm and below process nodes, two features must be assigned opposite colors (corresponding to different ex...
Andrew B. Kahng, Chul-Hong Park, Xu Xu, Hailong Ya...
97
Voted
ENTCS
2007
116views more  ENTCS 2007»
14 years 9 months ago
Experiments in Cost Analysis of Java Bytecode
Recently, we proposed a general framework for the cost analysis of Java bytecode which can be used for measuring resource usage. This analysis generates, at compile-time, cost rel...
Elvira Albert, Puri Arenas, Samir Genaim, Germ&aac...
ICFP
2009
ACM
15 years 10 months ago
Parallel concurrent ML
Concurrent ML (CML) is a high-level message-passing language that supports the construction of first-class synchronous abstractions called events. This mechanism has proven quite ...
John H. Reppy, Claudio V. Russo, Yingqi Xiao
ISSTA
2012
ACM
12 years 12 months ago
Finding errors in multithreaded GUI applications
To keep a Graphical User Interface (GUI) responsive and active, a GUI application often has a main UI thread (or event dispatching thread) and spawns separate threads to handle le...
Sai Zhang, Hao Lü, Michael D. Ernst
DCC
2007
IEEE
15 years 9 months ago
Algorithms and Hardware Structures for Unobtrusive Real-Time Compression of Instruction and Data Address Traces
Instruction and data address traces are widely used by computer designers for quantitative evaluations of new architectures and workload characterization, as well as by software de...
Milena Milenkovic, Aleksandar Milenkovic, Martin B...