Double Patterning Lithography (DPL) is one of the few hopeful candidate solutions for the lithography for CMOS process beyond 45nm. DPL assigns the patterns less than a certain di...
Scalable similarity search is the core of many large scale learning or data mining applications. Recently, many research results demonstrate that one promising approach is creatin...
This paper presents a logic restructuring technique named node addition and removal (NAR). It works by adding a node into a circuit to replace an existing node and then removing t...
Recently, several algorithms for interconnect optimization via repeater insertion and wire sizing have appeared based on the Elmore delay model. Using the Devgan noise metric [6] ...
In this paper we present an approach to multi-objective exploration of the mapping space of a mesh-based network-on-chip architecture. Based on evolutionary computing techniques, ...