—Double patterning lithography (DPL) provides an attractive alternative or a supplementary method to enable the 32nm and 22nm process nodes, relative to costlier technology optio...
Kwangok Jeong, Andrew B. Kahng, Rasit Onur Topalog...
The increasing availability of electronic communication data, such as that arising from e-mail exchange, presents social and information scientists with new possibilities for char...
R. Dean Malmgren, Jake M. Hofman, Luis A. N. Amara...
We describe a method for writing assumption/guarantee specifications of concurrent systems. We also provide a proof rule for reasoning about the composition of these systems. Spec...
We formally define--at the stream transformer level--a class of synchronous circuits that tolerate any variability in the latency of their environment. We study behavioral properti...
Sava Krstic, Jordi Cortadella, Michael Kishinevsky...
This paper presents a formal notation for modelling asynchronous web services composition, using context and coordination mechanisms. Our notation specifies the messages that can b...