It is impossible to implement one tool that supports all activities in software development. Thus, it is important to focus on integration of different tools, ideally giving devel...
Christian Heide Damm, Klaus Marius Hansen, Michael...
Abstract--To reduce chip-scale topography variation in Chemical Mechanical Polishing (CMP) process, dummy fill is widely used to improve the layout density uniformity. Previous res...
Chunyang Feng, Hai Zhou, Changhao Yan, Jun Tao, Xu...
This paper presents a method of using texture mapping with mipmapping to render a VLSI layout. Texture mapping is used to save already rasterized areas of the layout from frame to...