—As the 193nm lithography is likely to be used for 45nm and even 32nm processes, much more stringent requirement will be posed on Optical Proximity Correction (OPC) technologies....
Abstract. We study a number of embedded DSLs for autonomous ordinary differential equations (autonomous ODEs) in Haskell. A naive implementation based on the lazy tower of derivat...
In this paper, we propose two new, perceptually motivated strategies to better measure the similarity of 2D shape instances that are in the form of closed contours. The first strat...
Andrew Temlyakov, Brent C. Munsell, Jarrell W. Wag...
Web image search using text queries has received considerable attention. However, current state-of-the-art approaches require training models for every new query, and are therefore...
Josip Krapac, Moray Allan, Jakob Verbeek, Frédér...
— In pervasive environment, it is essential for computing applications to be context-aware. However, one of the major challenges is the establishment of a generic and dynamic con...