Abstract--In double patterning lithography (DPL) layout decomposition for 45nm and below process nodes, two features must be assigned opposite colors (corresponding to different ex...
Andrew B. Kahng, Chul-Hong Park, Xu Xu, Hailong Ya...
As mobile devices, such as laptops, PDAs or mobile phones, are getting more and more ubiquitous and are able to communicate with each other via wireless technologies, the paradigm...
The standard dispatching mechanisms built into programming languages are sometimes inadequate to the needs of the programmer. In the case of Java, the need for more flexibility h...
With the circuit density available in today’s ASIC design systems, increased integration is possible creating more complexity in the design of a System on a Chip (SoC). IBM’s ...
C. Ross Ogilvie, Richard Ray, Robert Devins, Mark ...
—In increasingly many cases of interest in computer vision and pattern recognition, one is often confronted with the situation where data size is very large. Usually, the labels ...