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» Concurrency by modularity: design patterns, a case in point
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TCAD
2010
194views more  TCAD 2010»
14 years 4 months ago
Layout Decomposition Approaches for Double Patterning Lithography
Abstract--In double patterning lithography (DPL) layout decomposition for 45nm and below process nodes, two features must be assigned opposite colors (corresponding to different ex...
Andrew B. Kahng, Chul-Hong Park, Xu Xu, Hailong Ya...
MSWIM
2006
ACM
15 years 3 months ago
Pattern matching based link quality prediction in wireless mobile ad hoc networks
As mobile devices, such as laptops, PDAs or mobile phones, are getting more and more ubiquitous and are able to communicate with each other via wireless technologies, the paradigm...
Károly Farkas, Theus Hossmann, Lukas Ruf, B...
OOPSLA
2005
Springer
15 years 3 months ago
PolyD: a flexible dispatching framework
The standard dispatching mechanisms built into programming languages are sometimes inadequate to the needs of the programmer. In the case of Java, the need for more flexibility h...
Antonio Cunei, Jan Vitek
ICCD
2003
IEEE
123views Hardware» more  ICCD 2003»
15 years 6 months ago
Simplifying SoC design with the Customizable Control Processor Platform
With the circuit density available in today’s ASIC design systems, increased integration is possible creating more complexity in the design of a System on a Chip (SoC). IBM’s ...
C. Ross Ogilvie, Richard Ray, Robert Devins, Mark ...
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TIP
2010
155views more  TIP 2010»
14 years 7 months ago
Laplacian Regularized D-Optimal Design for Active Learning and Its Application to Image Retrieval
—In increasingly many cases of interest in computer vision and pattern recognition, one is often confronted with the situation where data size is very large. Usually, the labels ...
Xiaofei He