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ICIP
2010
IEEE
14 years 7 months ago
Stochastic gradient descent for robust inverse photomask synthesis in optical lithography
Optical lithography is a critical step in the semiconductor manufacturing process, and one key problem is the design of the photomask for a particular circuit pattern, given the o...
Ningning Jia, Edmund Y. Lam
HYBRID
2007
Springer
15 years 3 months ago
Robust, Optimal Predictive Control of Jump Markov Linear Systems Using Particles
Hybrid discrete-continuous models, such as Jump Markov Linear Systems, are convenient tools for representing many real-world systems; in the case of fault detection, discrete jumps...
Lars Blackmore, Askar Bektassov, Masahiro Ono, Bri...
CCE
2004
14 years 9 months ago
Optimization under uncertainty: state-of-the-art and opportunities
A large number of problems in production planning and scheduling, location, transportation, finance, and engineering design require that decisions be made in the presence of uncer...
Nikolaos V. Sahinidis
ICASSP
2011
IEEE
14 years 1 months ago
Efficient convex optimization for real-time robust beamforming with microphone arrays
This paper presents an efficient implementation of a robust adaptive beamforming algorithm based on convex optimization for applications in the processing-constrained environment...
Eric A. Durant, Ivo Merks, Bill Woods, Jinjun Xiao...
EH
2005
IEEE
127views Hardware» more  EH 2005»
15 years 3 months ago
On the Robustness Achievable with Stochastic Development Processes
Manufacturing processes are a key source of faults in complex hardware systems. Minimizing this impact of manufacturing uncertainties is one way towards achieving fault tolerant s...
Shivakumar Viswanathan, Jordan B. Pollack