3972 search results - page 692 / 795 » Cosparse analysis modeling - uniqueness and algorithms |
136
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ICCAD
2009
IEEE
15 years 1 months ago
2009
IEEE
Double patterning lithography (DPL) is a likely resolution enhancement technique for IC production in 32nm and below technology nodes. However, DPL gives rise to two independent, ...
124
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ATVA
2008
Springer
15 years 5 months ago
2008
Springer
1 : Logic in Specification and Verification (abstract) Natarajan Shankar (SRI) Session Chair : Sungdeok Cha 12 : 00 13 : 00 Lunch 13 : 00 15 : 00 2 : Boolean Modeling of Cell Biolo...
138
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BMCBI
2005
15 years 3 months ago
2005
Background: Exhaustive methods of sequence alignment are accurate but slow, whereas heuristic approaches run quickly, but their complexity makes them more difficult to implement. ...
135
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SPAA
2010
ACM
15 years 3 months ago
2010
ACM
We study the communication complexity of rumor spreading in the random phone-call model. Suppose n players communicate in parallel rounds, where in each round every player calls a...
129
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BMCBI
2008
15 years 3 months ago
2008
Background: Comparative analysis of expression microarray studies is difficult due to the large influence of technical factors on experimental outcome. Still, the identified diffe...