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ICIP
2010
IEEE
15 years 1 months ago
Stochastic gradient descent for robust inverse photomask synthesis in optical lithography
Optical lithography is a critical step in the semiconductor manufacturing process, and one key problem is the design of the photomask for a particular circuit pattern, given the o...
Ningning Jia, Edmund Y. Lam
143
Voted
ICRA
2010
IEEE
158views Robotics» more  ICRA 2010»
15 years 1 months ago
A measurement distribution framework for cooperative navigation using multiple AUVs
Abstract-- In recent years underwater survey and surveillance missions with more than a single Autonomous Underwater Vehicle (AUV) have become more common thanks to more reliable a...
Maurice F. Fallon, Georgios Papadopoulos, John J. ...
ICTAI
2010
IEEE
15 years 1 months ago
An Effective Multilevel Memetic Algorithm for Balanced Graph Partitioning
The balanced graph partitioning consists in dividing the vertices of an undirected graph into a given number of subsets of approximately equal size, such that the number of edges c...
Una Benlic, Jin-Kao Hao
INDOCRYPT
2010
Springer
15 years 1 months ago
Attack on a Higher-Order Masking of the AES Based on Homographic Functions
In the recent years, Higher-order Side Channel attacks have been widely investigated. In particular, 2nd-order DPA have been improved and successfully applied to break several mask...
Emmanuel Prouff, Thomas Roche
176
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KBSE
2010
IEEE
15 years 1 months ago
Reconfigurable run-time support for distributed service component architectures
SCA (Service Component Architecture) is an OASIS standard for describing service-oriented middleware architectures. In particular, SCA promotes a disciplined way for designing dis...
Rémi Mélisson, Philippe Merle, Danie...