3695 search results - page 130 / 739 » Design patterns for parsing |
139
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DAC
2009
ACM
16 years 5 months ago
2009
ACM
In double patterning lithography (DPL), coloring conflict and stitch minimization are the two main challenges. Post layout decomposition algorithm [1] [2]may not be enough to achi...
112
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DATE
2003
IEEE
15 years 9 months ago
2003
IEEE
Abstract : A novel design methodology for test pattern generation in BIST is presented. Here faults and errors in the generator itself are detected. Two different design methodolog...
137
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ECOOP
2008
Springer
15 years 6 months ago
2008
Springer
The adapter design pattern [1], commonly used for integration and evolution in component-based systems, is originally described by roles. In classbased systems, the conventional re...
161
Voted
ISPD
2007
ACM
15 years 6 months ago
2007
ACM
When VLSI technology scales toward 45nm, the lithography wavelength stays at 193nm. This large gap results in strong refractive effects in lithography. Consequently, it is a huge...
139
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DC
2001
15 years 6 months ago
2001
This paper presents a streamlined metadata record format designed to support the permanence of network discoverable objects. It starts with the Dublin Core consensus and distills ...