Real production code contains lots of knowledge—on the domain, on the architecture, and on the environment. How can we leverage this knowledge in new projects? Using a novel lig...
Natalie Gruska, Andrzej Wasylkowski, Andreas Zelle...
Almost all automatic semantic role labeling (SRL) systems rely on a preliminary parsing step that derives a syntactic structure from the sentence being analyzed. This makes the ch...
Telegraphic messages with numerous instances of omission pose a new challenge to parsing in that a sentence with omission causes a higher degree of ambi6uity than a sentence witho...
Young-Suk Lee, Clifford J. Weinstein, Stephanie Se...
This paper describes a new collaboration technology that is based on the support of lightweight, informally structured, opportunistic activities featuring heterogeneous threads of...
David R. Millen, Michael J. Muller, Werner Geyer, ...
Double Patterning Lithography (DPL) is one of the few hopeful candidate solutions for the lithography for CMOS process beyond 45nm. DPL assigns the patterns less than a certain di...