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ICSE
2003
IEEE-ACM
16 years 5 months ago
Patterns, Frameworks, and Middleware: Their Synergistic Relationships
The knowledge required to develop complex software has historically existed in programming folklore, the heads of experienced developers, or buried deep in the code. These locatio...
Douglas C. Schmidt, Frank Buschmann
ICMI
2003
Springer
128views Biometrics» more  ICMI 2003»
15 years 10 months ago
Modeling multimodal integration patterns and performance in seniors: toward adaptive processing of individual differences
Multimodal interfaces are designed with a focus on flexibility, although very few currently are capable of adapting to major sources of user, task, or environmental variation. The...
Benfang Xiao, Rebecca Lunsford, Rachel Coulston, R...
IUSED
2008
15 years 7 months ago
Preparing Usability Supporting Architectural Patterns for Industrial Use
Usability supporting architectural patterns (USAPs) have been shown to provide developers with useful guidance for producing a software architecture design that supports usability...
Pia Stoll, Bonnie E. John, Len Bass, Elspeth Golde...
153
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AROBOTS
2008
177views more  AROBOTS 2008»
15 years 5 months ago
Controlling swimming and crawling in a fish robot using a central pattern generator
Online trajectory generation for robots with multiple degrees of freedom is still a difficult and unsolved problem, in particular for non-steady state locomotion, that is, when th...
Alessandro Crespi, Daisy Lachat, Ariane Pasquier, ...
ICCAD
2009
IEEE
151views Hardware» more  ICCAD 2009»
15 years 3 months ago
Timing yield-aware color reassignment and detailed placement perturbation for double patterning lithography
Double patterning lithography (DPL) is a likely resolution enhancement technique for IC production in 32nm and below technology nodes. However, DPL gives rise to two independent, ...
Mohit Gupta, Kwangok Jeong, Andrew B. Kahng