Abstract--In double patterning lithography (DPL) layout decomposition for 45nm and below process nodes, two features must be assigned opposite colors (corresponding to different ex...
Andrew B. Kahng, Chul-Hong Park, Xu Xu, Hailong Ya...
Background: High-throughput re-sequencing, new genotyping technologies and the availability of reference genomes allow the extensive characterization of Single Nucleotide Polymorp...
With technology scaling, manufacture-time and in-field permanent faults are becoming a fundamental problem. Multi-core architectures with spares can tolerate them by detecting an...
Shuou Nomura, Matthew D. Sinclair, Chen-Han Ho, Ve...
Background: Next-generation sequencing (NGS) offers a unique opportunity for high-throughput genomics and has potential to replace Sanger sequencing in many fields, including de-n...
Mattia C. F. Prosperi, Luciano Prosperi, Alessandr...
Mobile phones are becoming the convergent platform for personal sensing, computing, and communication. This paper attempts to exploit this convergence towards the problem of autom...
Chuan Qin, Xuan Bao, Romit Roy Choudhury, Srihari ...