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ICIP
2010
IEEE
14 years 7 months ago
Stochastic gradient descent for robust inverse photomask synthesis in optical lithography
Optical lithography is a critical step in the semiconductor manufacturing process, and one key problem is the design of the photomask for a particular circuit pattern, given the o...
Ningning Jia, Edmund Y. Lam
MICCAI
2008
Springer
15 years 10 months ago
Kinetic Modeling Based Probabilistic Segmentation for Molecular Images
Abstract. We propose a semi-supervised, kinetic modeling based segmentation technique for molecular imaging applications. It is an iterative, self-learning algorithm based on uncer...
Ahmed Saad, Benjamin Smith 0002, Ghassan Hamarneh,...
ISLPED
2006
ACM
83views Hardware» more  ISLPED 2006»
15 years 3 months ago
Considering process variations during system-level power analysis
Process variations will increasingly impact the operational characteristics of integrated circuits in nanoscale semiconductor technologies. Researchers have proposed various desig...
Saumya Chandra, Kanishka Lahiri, Anand Raghunathan...
CHI
2008
ACM
15 years 10 months ago
Activity-based prototyping of ubicomp applications for long-lived, everyday human activities
We designed an activity-based prototyping process realized in the ActivityDesigner system that combines the theoretical framework of Activity-Centered Design with traditional iter...
Yang Li, James A. Landay
ICDCS
2009
IEEE
15 years 6 months ago
CAP: A Context-Aware Privacy Protection System for Location-Based Services
We address issues related to privacy protection in location-based services (LBS). Most existing research in this field either requires a trusted third-party (anonymizer) or uses ...
Aniket Pingley, Wei Yu, Nan Zhang 0004, Xinwen Fu,...