There are many resource restrictions in real production/inventory systems (for example, budget, storage, transportation capacity, etc.). But unlike other research areas, there is ...
Abstract--To reduce chip-scale topography variation in Chemical Mechanical Polishing (CMP) process, dummy fill is widely used to improve the layout density uniformity. Previous res...
Chunyang Feng, Hai Zhou, Changhao Yan, Jun Tao, Xu...
Skyline queries have attracted considerable attention over the last few years, mainly due to their ability to return interesting objects without the need for user-defined scoring f...
The recent proliferation of graph data in a wide spectrum of applications has led to an increasing demand for advanced data analysis techniques. In view of this, many graph mining ...
One approach in verifying the correctness of a multiprocessor system is to show that its execution results comply with the memory consistency model it is meant to implement. It ha...