Achieving design closure is one of the biggest headaches for modern VLSI designers. This problem is exacerbated by high-level design automation tools that ignore increasingly impo...
Zhenyu (Peter) Gu, Jia Wang, Robert P. Dick, Hai Z...
As the process technology enters the nanometer era, reliability has become a major concern in the design and manufacturing of VLSI circuits. In this paper we focus on one reliabil...
Ever-growing complexity is forcing design to move above RTL. For example, golden functional models are being written as clearly as possible in software and not optimized or intend...
Antenna effect may damage gate oxides during plasma-based fabrication process. The antenna ratio of total exposed antenna area to total gate oxide area is directly related to the ...
In most web sites, web-based applications (such as web portals, emarketplaces, search engines), and in the file systems of personal computers, a wide variety of schemas (such as t...
Paolo Bouquet, Luciano Serafini, Stefano Zanobini,...