Abstract--To reduce chip-scale topography variation in Chemical Mechanical Polishing (CMP) process, dummy fill is widely used to improve the layout density uniformity. Previous res...
Chunyang Feng, Hai Zhou, Changhao Yan, Jun Tao, Xu...
A critical problem in implementing interactive perception applications is the considerable computational cost of current computer vision and machine learning algorithms, which typ...
Padmanabhan Pillai, Lily B. Mummert, Steven W. Sch...
Location-based context is important for many applications. Previous systems offered only coarse room-level features or used manually specified room regions to determine fine-sca...
David Demirdjian, Konrad Tollmar, Kimberle Koile, ...
As the process technology enters the nanometer era, reliability has become a major concern in the design and manufacturing of VLSI circuits. In this paper we focus on one reliabil...
The development of complex scientific applications for high-end systems is a challenging task. Addressing complexity of the involved software and algorithms is becoming increasing...
Manojkumar Krishnan, Yuri Alexeev, Theresa L. Wind...