As an increasingly large number of OWL ontologies become available on the Semantic Web and the descriptions in the ontologies become more complicated, finding the cause of errors ...
As we move from deep submicron technology to nanotechnology for device manufacture, the need for defect-tolerant architectures is gaining importance. This is because, at the nanos...
Gethin Norman, David Parker, Marta Z. Kwiatkowska,...
In this paper, an efficient Montgomery multiplier is introduced for the modular exponentiation operation, which is fundamental to numerous public-key cryptosystems. Four aspects a...
This article introduces a new program transformation in order to enhance the numerical accuracy of floating-point computations. We consider that a program would return an exact r...
Abstract— Double patterning lithography (DPL) is in current production for memory products, and is widely viewed as inevitable for logic products at the 32nm node. DPL decomposes...