—As the 193nm lithography is likely to be used for 45nm and even 32nm processes, much more stringent requirement will be posed on Optical Proximity Correction (OPC) technologies....
Reliable prediction of parametric yield for a specific design is difficult; a significant reason is the reliance of the yield estimation methods on the hard-to-measure distributio...
Concept maps are an important tool to knowledge organization, representation, and sharing. Most current concept map tools do not provide full support for hand-drawn concept map cr...
Using content-specific models to guide information retrieval and extraction can provide richer interfaces to endusers for both understanding the context of news events and navigat...
Earl J. Wagner, Jiahui Liu, Larry Birnbaum, Kennet...
Boolean satisfiability (SAT) and its extensions are becoming a core technology for the analysis of systems. The SAT-based approach divides into three steps: encoding, preprocessin...