3630 search results - page 527 / 726 » Fast Marching Methods |
121
Voted
ICCAD
2007
IEEE
16 years 22 days ago
2007
IEEE
—As the 193nm lithography is likely to be used for 45nm and even 32nm processes, much more stringent requirement will be posed on Optical Proximity Correction (OPC) technologies....
129
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ICCAD
2003
IEEE
16 years 22 days ago
2003
IEEE
This paper presents an efficient method to reduce complexities of a linear network in s-domain. The new method works on circuit matrices directly and reduces the circuit complexi...
156
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CVPR
2010
IEEE
16 years 9 days ago
2010
IEEE
This paper studies the problem of simultaneously aligning a batch of linearly correlated images despite gross corruption (such as occlusion). Our method seeks an optimal set of im...
244
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Publication
We propose a fast and robust CV-SLAM (Ceiling Vision –based Simultaneous Localization and Mapping) technique using a single ceiling vision sensor. The proposed algorithm is suita...
109
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SAC
2009
ACM
15 years 10 months ago
2009
ACM
Outlyingness is a subjective concept relying on the isolation level of a (set of) record(s). Clustering-based outlier detection is a field that aims to cluster data and to detect...