In double patterning lithography (DPL), coloring conflict and stitch minimization are the two main challenges. Post layout decomposition algorithm [1] [2]may not be enough to achi...
Abstract : A novel design methodology for test pattern generation in BIST is presented. Here faults and errors in the generator itself are detected. Two different design methodolog...
Dhiraj K. Pradhan, Chunsheng Liu, Krishnendu Chakr...
The adapter design pattern [1], commonly used for integration and evolution in component-based systems, is originally described by roles. In classbased systems, the conventional re...
We propose and evaluate a model for controlling infection patterns defined over rounds or real time in a gossipbased protocol using adaptive fanout. We model three versions of go...
In this paper we present a new document representation model based on implicit user feedback obtained from search engine queries. The main objective of this model is to achieve be...