Linear Support Vector Machines (SVMs) have become one of the most prominent machine learning techniques for highdimensional sparse data commonly encountered in applications like t...
Double Patterning Lithography (DPL) is one of the few hopeful candidate solutions for the lithography for CMOS process beyond 45nm. DPL assigns the patterns less than a certain di...
A hole in a graph is an induced cycle on at least four vertices. A graph is Berge if it has no odd hole and if its complement has no odd hole. In 2002, Chudnovsky, Robertson, Seym...
The problem of similarity search (query-by-content) has attracted much research interest. It is a difficult problem because of the inherently high dimensionality of the data. The ...
Abstract--To reduce chip-scale topography variation in Chemical Mechanical Polishing (CMP) process, dummy fill is widely used to improve the layout density uniformity. Previous res...
Chunyang Feng, Hai Zhou, Changhao Yan, Jun Tao, Xu...