Double Patterning Lithography (DPL) is one of the few hopeful candidate solutions for the lithography for CMOS process beyond 45nm. DPL assigns the patterns less than a certain di...
Abstract. Design patterns are templates of general solutions to commonlyoccurring problems in the analysis and design of software systems. In mature development processes, engineer...
The current paper makes two contributions for the graph pattern matching problem of model transformation tools. First, model-sensitive search plan generation is proposed for patte...
A method to generate test patterns referred to as defect aware test patterns is proposed. Defect aware test patterns have greater ability to detect un-modeled defects. The propose...
Huaxing Tang, Gang Chen, Sudhakar M. Reddy, Chen W...
This paper addresses the problem of computing planar patterns for compression garments. In the garment industry, the compression garment has been more and more widely used to reta...