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ISPD
2010
ACM
249views Hardware» more  ISPD 2010»
15 years 4 months ago
A matching based decomposer for double patterning lithography
Double Patterning Lithography (DPL) is one of the few hopeful candidate solutions for the lithography for CMOS process beyond 45nm. DPL assigns the patterns less than a certain di...
Yue Xu, Chris Chu
ECMDAFA
2006
Springer
228views Hardware» more  ECMDAFA 2006»
15 years 1 months ago
Model Driven Development of Multi-Agent Systems
Abstract. Design patterns are templates of general solutions to commonlyoccurring problems in the analysis and design of software systems. In mature development processes, engineer...
Juan Pavón, Jorge J. Gómez-Sanz, Rub...
96
Voted
ENTCS
2006
162views more  ENTCS 2006»
14 years 9 months ago
Adaptive Graph Pattern Matching for Model Transformations using Model-sensitive Search Plans
The current paper makes two contributions for the graph pattern matching problem of model transformation tools. First, model-sensitive search plan generation is proposed for patte...
Gergely Varró, Katalin Friedl, Dánie...
DATE
2005
IEEE
104views Hardware» more  DATE 2005»
15 years 3 months ago
Defect Aware Test Patterns
A method to generate test patterns referred to as defect aware test patterns is proposed. Defect aware test patterns have greater ability to detect un-modeled defects. The propose...
Huaxing Tang, Gang Chen, Sudhakar M. Reddy, Chen W...
80
Voted
CAD
2010
Springer
14 years 9 months ago
Pattern computation for compression garment by a physical/geometric approach
This paper addresses the problem of computing planar patterns for compression garments. In the garment industry, the compression garment has been more and more widely used to reta...
Charlie C. L. Wang, Kai Tang