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152
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TCAD
2002
15 years 4 months ago
2002
Chemical-mechanical polishing (CMP) and other manufacturing steps in very deep submicron VLSI have varying effects on device and interconnect features, depending on local character...
138
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PVLDB
2010
15 years 3 months ago
2010
The performance of external sorting using merge sort is highly dependent on the length of the runs generated. One of the most commonly used run generation strategies is Replacemen...
174
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PAMI
2010
14 years 11 months ago
2010
In this paper, we present a novel approach to 3D face matching that shows high effectiveness in distinguishing facial differences between distinct individuals from differences indu...
160
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DAC
2011
ACM
14 years 4 months ago
2011
ACM
As transistor dimensions continue to scale deep into the nanometer regime, silicon reliability is becoming a chief concern. At the same time, transistor counts are scaling up, ena...
193
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CVPR
2009
IEEE
16 years 11 months ago
2009
IEEE
The computer aided diagnosis (CAD) problems of detecting
potentially diseased structures from medical images are
typically distinguished by the following challenging characterist...