Abstract-- This paper presents the results obtained from an experimental study of the impact of modern process technologies on the electrical parameters of interconnects. Variation...
Process variations have become a serious concern for nanometer technologies. The interconnect and device variations include interand intra-die variations of geometries, as well as...
Xiaoning Qi, Alex Gyure, Yansheng Luo, Sam C. Lo, ...
—Regular multi-core processors are appearing in the embedded system market as high performance software programmable solutions. The use of regular interconnect fabrics for them a...
The statistical variations in electrical parameters, such as transistor gain factors and interconnect resistances, due to variations in the manufacturing process are studied using...
Suriyaprakash Natarajan, Melvin A. Breuer, Sandeep...
Process technology and environment-induced variability of gates and wires in VLSI circuits make timing analyses of such circuits a challenging task. Process variation can have a s...