525 search results - page 32 / 105 » Improved Circular Layouts |
ICCAD
2008
IEEE
15 years 6 months ago
2008
IEEE
— Double patterning technology (DPT) is a most likely lithography solution for 32/22nm technology nodes as of 2008 due to the delay of Extreme Ultra Violet lithography. However, ...
JUCS
2008
14 years 9 months ago
2008
: In this paper we present a novel methodology to recognize the layout structure of handwritten filled table-forms. Recognition methodology includes locating line intersections, co...
GD
1995
Springer
15 years 1 months ago
1995
Springer
We present a 3-D version of GEM [6], a randomized adaptive layout algorithm for nicely drawing undirected graphs, based on the spring-embedder paradigm [4]. The new version, GEM-3D...
ICDAR
2003
IEEE
15 years 3 months ago
2003
IEEE
In this paper we present a system to locate, extract and recognize Telugu text. The circular nature of Telugu script is exploited for segmenting text regions using the Hough Trans...
WSC
2008
15 years 2 days ago
2008
This paper presents the design and development of a template for analyzing shaft construction projects. It is suitable for integration with the existing Tunneling template of the ...