Double Patterning Lithography (DPL) is one of the few hopeful candidate solutions for the lithography for CMOS process beyond 45nm. DPL assigns the patterns less than a certain di...
—During the evolution of a software system, a large amount of information, which is not always directly related to the source code, is produced. Several researchers have provided...
Alberto Bacchelli, Marco D'Ambros, Michele Lanza, ...
Abstract— We study multi-robot routing problems (MRLDR) where a team of robots has to visit a set of given targets with linear decreasing rewards over time, such as required for ...
— The paper studies the cyclic pursuit problem in presence of connectivity constraints among single-integrator agents. The robots, each one pursuing its leading neighbor along th...
—We consider a scheduling problem in which a bounded number of jobs can be processed simultaneously by a single machine. The input is a set of n jobs J = {J1, . . . , Jn}. Each j...