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ICIP
2010
IEEE
15 years 2 months ago
2010
IEEE
Optical lithography is a critical step in the semiconductor manufacturing process, and one key problem is the design of the photomask for a particular circuit pattern, given the o...
179
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ICPR
2010
IEEE
15 years 2 months ago
2010
IEEE
For the 3D modeling of walking humans the determination of body pose and extraction of body parts, from the sensed 3D range data, are challenging image processing problems. Real b...
165
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ICST
2010
IEEE
15 years 2 months ago
2010
IEEE
A Feature Model (FM) is a compact representation of all the products of a software product line. The automated extraction of information from FMs is a thriving research topic invo...
170
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ICTAI
2010
IEEE
15 years 2 months ago
2010
IEEE
Abstract--The difficulties encountered in sequential decisionmaking problems under uncertainty are often linked to the large size of the state space. Exploiting the structure of th...
168
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NAACL
2010
15 years 2 months ago
2010
We present three approaches for unsupervised grammar induction that are sensitive to data complexity and apply them to Klein and Manning's Dependency Model with Valence. The ...