—Double patterning lithography (DPL) provides an attractive alternative or a supplementary method to enable the 32nm and 22nm process nodes, relative to costlier technology optio...
Kwangok Jeong, Andrew B. Kahng, Rasit Onur Topalog...
In this paper, we present a new approach for segmentation of tubular structures in 2D images providing minimal interaction. The main objective is to extract centerlines and bounda...
Fethallah Benmansour, Laurent D. Cohen, Max W. K. ...
As information networks become ubiquitous, extracting knowledge from information networks has become an important task. Both ranking and clustering can provide overall views on in...
Given a set of robots with arbitrary initial location and no agreement on a global coordinate system, convergence requires that all robots asymptotically approach the exact same, ...
Zohir Bouzid, Maria Gradinariu Potop-Butucaru, S&e...