55 search results - page 6 / 11 » Lithography Driven Layout Design |
DATE
2006
IEEE
15 years 3 months ago
2006
IEEE
High level synthesis transformations play a major part in shaping the properties of the final circuit. However, most optimizations are performed without much knowledge of the fina...
DAC
2003
ACM
15 years 10 months ago
2003
ACM
As minimum feature sizes continue to shrink, patterned features have become significantly smaller than the wavelength of light used in optical lithography. As a result, the requir...
ICCAD
2003
IEEE
15 years 6 months ago
2003
IEEE
Ultra-deep submicron manufacturability impacts physical design (PD) through complex layout rules and large guardbands for process variability; this creates new requirements for ne...
ISPD
2010
ACM
15 years 4 months ago
2010
ACM
Standard cells are fundamental circuit building blocks designed at very early design stages. Nanometer standard cells are prone to lithography proximity and process variations. Ho...
ASPDAC
2006
ACM
15 years 3 months ago
2006
ACM
This paper advances a new methodology based on signal-path information to resolve the problem of device-level placement for analog layout. This methodology is mainly based on three...