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ISVLSI
2007
IEEE
161views VLSI» more  ISVLSI 2007»
15 years 8 months ago
CMP-aware Maze Routing Algorithm for Yield Enhancement
— Chemical-Mechanical Polishing (CMP) is one of the key steps during nanometer VLSI manufacturing process where minimum variation of layout pattern densities is desired. This pap...
Hailong Yao, Yici Cai, Xianlong Hong
104
Voted
NPAR
2006
ACM
15 years 8 months ago
Modeling plant structures using concept sketches
Creating 3D plant models is often a hard and laborious task. To make it easier and more natural, we propose a sketch-based interface for modeling single-compound plant structures ...
Fabricio Anastacio, Mario Costa Sousa, Faramarz F....
125
Voted
SI3D
2006
ACM
15 years 8 months ago
Relief mapping of non-height-field surface details
The ability to represent non-height-field mesostructure details is of great importance for rendering complex surface patterns, such as weave and multilayer structures. Currently,...
Fabio Policarpo, Manuel Menezes de Oliveira Neto
SLSFS
2005
Springer
15 years 8 months ago
Incorporating Constraints and Prior Knowledge into Factorization Algorithms - An Application to 3D Recovery
Abstract. Matrix factorization is a fundamental building block in many computer vision and machine learning algorithms. In this work we focus on the problem of ”structure from mo...
Amit Gruber, Yair Weiss
111
Voted
NPAR
2004
ACM
15 years 8 months ago
Rendering cracks in Batik
We present an algorithm for simulating the cracks found in Batik wax painting and dyeing technique used to make images on cloth. The algorithm produces cracks similar to those fou...
Brian Wyvill, Cornelius W. A. M. van Overveld, M. ...