Double patterning lithography (DPL) is a likely resolution enhancement technique for IC production in 32nm and below technology nodes. However, DPL gives rise to two independent, ...
Abstract— Double patterning lithography (DPL) is in current production for memory products, and is widely viewed as inevitable for logic products at the 32nm node. DPL decomposes...
Many documents such as Web documents or XML files have tree structures. A term tree is an unordered tree pattern consisting of internal variables and tree structures. In order to ...
We introduce FuncICA, a new independent component analysis method for pattern discovery in inherently functional data, such as time series data. FuncICA can be considered an analo...
Pattern matching for network security and intrusion detection demands exceptionally high performance. Much work has been done in this field, and yet there is still significant roo...