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» Model Reuse through Hardware Design Patterns
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ISPD
2010
ACM
249views Hardware» more  ISPD 2010»
15 years 4 months ago
A matching based decomposer for double patterning lithography
Double Patterning Lithography (DPL) is one of the few hopeful candidate solutions for the lithography for CMOS process beyond 45nm. DPL assigns the patterns less than a certain di...
Yue Xu, Chris Chu
DATE
2002
IEEE
144views Hardware» more  DATE 2002»
15 years 2 months ago
Design Automation for Deepsubmicron: Present and Future
Advancing technology drives design technology and thus design automation EDA. How to model interconnect, how to handle degradation of signal integrity and increasing power densi...
Ralph H. J. M. Otten, Raul Camposano, Patrick Groe...
EH
2000
IEEE
84views Hardware» more  EH 2000»
15 years 1 months ago
Evolutionary Design of Single Electron Systems
The differences between electronics design through artificial evolution and through conventional methods have the consequence that evolved circuits may take unusual leverage from ...
Adrian Thompson, Christoph Wasshuber
IWANN
1997
Springer
15 years 1 months ago
The Pattern Extraction Architecture: A Connectionist Alternative to the Von Neumann Architecture
A detailed connectionist architecture is described which is capable of relating psychological behavior to the functioning of neurons and neurochemicals. The need to be able to bui...
L. Andrew Coward
OOPSLA
2007
Springer
15 years 3 months ago
CASE-FX: feature modeling support in an OO Case tool
Generative Programming advocates developing a family of systems rather than a set of single systems. Feature modeling can assist in supporting the development of such software pro...
Alain Forget, Dave Arnold, Sonia Chiasson