Double Patterning Lithography (DPL) is one of the few hopeful candidate solutions for the lithography for CMOS process beyond 45nm. DPL assigns the patterns less than a certain di...
Advancing technology drives design technology and thus design automation EDA. How to model interconnect, how to handle degradation of signal integrity and increasing power densi...
Ralph H. J. M. Otten, Raul Camposano, Patrick Groe...
The differences between electronics design through artificial evolution and through conventional methods have the consequence that evolved circuits may take unusual leverage from ...
A detailed connectionist architecture is described which is capable of relating psychological behavior to the functioning of neurons and neurochemicals. The need to be able to bui...
Generative Programming advocates developing a family of systems rather than a set of single systems. Feature modeling can assist in supporting the development of such software pro...