Double Patterning Lithography (DPL) is one of the few hopeful candidate solutions for the lithography for CMOS process beyond 45nm. DPL assigns the patterns less than a certain di...
One of the main problems in probabilistic grammatical inference consists in inferring a stochastic language, i.e. a probability distribution, in some class of probabilistic models...
materialized view selection is a non-trivial task. Hence, its complexity must be reduced. A judicious choice of views must be costdriven and influenced by the workload experienced...
In many text-processing applications, we would like shapes that expand (or shrink) in size to fit their textual content. We address how to efficiently compute the minimum size fo...
Advances in computer processing power and emerging algorithms are allowing new ways of envisioning Human Computer Interaction. This paper focuses on the development of a computing...
Zhihong Zeng, Jilin Tu, Brian Pianfetti, Ming Liu,...