Double patterning lithography (DPL) is a likely resolution enhancement technique for IC production in 32nm and below technology nodes. However, DPL gives rise to two independent, ...
Chemical-mechanical polishing (CMP) and other manufacturing steps in very deep submicron VLSI have varying effects on device and interconnect features, depending on local character...
Yu Chen, Andrew B. Kahng, Gabriel Robins, Alexande...
Abstract-- In battery driven portable applications, the minimization of energy, average power, peak power, and peak power differential are equally important to improve reliability ...
—In this paper, we explore the feasibility of using Mobile Ad-hoc Networks (MANETs) for rural public safety. First, we discuss a QoS enhancement to a standard routing protocol, D...
Chad Bohannan, Li Zhang, Jian Tang, Richard S. Wol...
Anomaly detection in IP networks, detection of deviations from what is considered normal, is an important complement to misuse detection based on known attack descriptions. Perfor...