571 search results - page 42 / 115 » New Event-Processing Design Patterns Using CEP |
125
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ISQED
2010
IEEE
15 years 11 months ago
2010
IEEE
—Double patterning lithography (DPL) provides an attractive alternative or a supplementary method to enable the 32nm and 22nm process nodes, relative to costlier technology optio...
159
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LOPSTR
2005
Springer
15 years 10 months ago
2005
Springer
We propose an extension of functional logic languages that allows the definition of operations with patterns containing other defined operation symbols. Such “function patterns...
254
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AIEDAM
2011
14 years 11 months ago
2011
In familiar design domains, expert designers are able to quickly focus on “good designs”, based on constraints they have learned while exploring the design space. This ability ...
213
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GIS
2008
ACM
16 years 5 months ago
2008
ACM
Efficient means of determining factors controlling spatial distribution of an environmental class variable are of significant interest in Earth science. In this paper, we present ...
147
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ICSM
2009
IEEE
15 years 11 months ago
2009
IEEE
Within a large, object-oriented software system it is common to partition the classes into a set of packages, which implicitly serve as a set of coarsely-grained logical design un...