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» On Modular Decomposition of Integers
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ECBS
2009
IEEE
193views Hardware» more  ECBS 2009»
14 years 7 months ago
CQML: Aspect-Oriented Modeling for Modularizing and Weaving QoS Concerns in Component-Based Systems
Current domain-specific modeling (DSM) frameworks for designing component-based systems often consider the system's structural and behavioral concerns as the two dominant con...
Sumant Tambe, Akshay Dabholkar, Aniruddha S. Gokha...
ASPDAC
2010
ACM
637views Hardware» more  ASPDAC 2010»
14 years 7 months ago
A new graph-theoretic, multi-objective layout decomposition framework for double patterning lithography
As Double Patterning Lithography(DPL) becomes the leading candidate for sub-30nm lithography process, we need a fast and lithography friendly decomposition framework. In this pape...
Jae-Seok Yang, Katrina Lu, Minsik Cho, Kun Yuan, D...
ISSAC
2007
Springer
177views Mathematics» more  ISSAC 2007»
15 years 3 months ago
Component-level parallelization of triangular decompositions
We discuss the parallelization of algorithms for solving polynomial systems symbolically by way of triangular decompositions. We introduce a component-level parallelism for which ...
Marc Moreno Maza, Yuzhen Xie
ICDT
2010
ACM
137views Database» more  ICDT 2010»
14 years 8 months ago
A Greedy Algorithm for Constructing a Low-Width Generalized Hypertree Decomposition
We propose a greedy algorithm which, given a hypergraph H and a positive integer k, produces a hypertree decomposition of width less than or equal to 3k −1, or determines that H...
Kaoru Katayama, Tatsuro Okawara, Yuka Itou
129
Voted
TCAD
2010
194views more  TCAD 2010»
14 years 4 months ago
Layout Decomposition Approaches for Double Patterning Lithography
Abstract--In double patterning lithography (DPL) layout decomposition for 45nm and below process nodes, two features must be assigned opposite colors (corresponding to different ex...
Andrew B. Kahng, Chul-Hong Park, Xu Xu, Hailong Ya...