Current domain-specific modeling (DSM) frameworks for designing component-based systems often consider the system's structural and behavioral concerns as the two dominant con...
Sumant Tambe, Akshay Dabholkar, Aniruddha S. Gokha...
As Double Patterning Lithography(DPL) becomes the leading candidate for sub-30nm lithography process, we need a fast and lithography friendly decomposition framework. In this pape...
Jae-Seok Yang, Katrina Lu, Minsik Cho, Kun Yuan, D...
We discuss the parallelization of algorithms for solving polynomial systems symbolically by way of triangular decompositions. We introduce a component-level parallelism for which ...
We propose a greedy algorithm which, given a hypergraph H and a positive integer k, produces a hypertree decomposition of width less than or equal to 3k −1, or determines that H...
Abstract--In double patterning lithography (DPL) layout decomposition for 45nm and below process nodes, two features must be assigned opposite colors (corresponding to different ex...
Andrew B. Kahng, Chul-Hong Park, Xu Xu, Hailong Ya...